Molecular beam epitaxy of free‐standing bulk wurtzite Al<sub>x</sub>Ga<sub>1‐x</sub>N layers using a highly efficient RF plasma source
- S. V. Novikov
- , C. R. Staddon
- , S.‐L. Sahonta
- , R. A. Oliver
- , C. J. Humphreys
- , C. T. Foxon
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